Fabrication of 1 D semiconducting microstructures using lithography

Modern technology relies heavily on semiconductor materials, from smartphones to solar panels. Among semiconductor materials, one-dimensional (1D) materials, such as nanowires and nanoribbons, offer exceptional electronic and optical properties. To realize the full potential of these 1D materials, it is imperative to control their synthesis and manipulate their structures precisely. In this project, we aim to develop a method for lithography-based fabrication of 1D semiconductor materials to provide innovative solutions. Managing the synthesis and precisely manipulating the structure of these 1D materials will be essential to realizing their full potential.
The goal of this research is to use lithography for manufacturing 1D semiconductor materials such as silicon nanowires. We also demonstrate how lithography techniques can be employed to manipulate individual silicon nanowires to fabricate nano-electronic devices. Through this approach, we hope to offer innovative ideas that will stimulate advances in technology and enable the development of more compact, effective, and effective electronic devices that may be used in a variety of sectors and corporations. The future stage of the digital century requires regulated manufacturing and manipulation of 1D semiconductor materials.

Faculty Supervisor:

Mohamed Chaker

Student:

Partner:

University of Cape Town

Discipline:

Physics

Sector:

Quantum Science; Nanotechnology; Advanced Manufacturing

University:

Université du Québec : Institut national de la recherche scientifique

Program: