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2-dimension (2D) materials have gained academic and industrial attention due to their high surface area-to-volume ratios, strong interatomic bonding, and good mechanical flexibility, making them suitable for a wide range of applications including energy storage, optoelectronics, and healthcare. An important step in realizing their potential is to build heterostructures by stacking 2D materials with thin metal oxide films. This can be primarily achieved by
1. Depositing metal oxides via Atomic Layer Deposition (ALD) onto 2D materials.
2. Growing 2D materials directly on metal oxide substrates.
While the former method might appear straightforward, metal oxide deposition remains challenging due to the passivated surface of 2D materials lacking dangling bonds, hindering the deposition of a thin, uniform film. This process could also induce electron doping, compromising the properties of the 2D materials. Hence, it’s imperative to investigate the second method of growing 2D materials directly on metal oxides providing solutions to the concerns. In this research project, we aim to develop a chemical vapor deposition technique to grow 2D materials directly on spatial ALD-grown metal oxides. We believe that the methodologies developed herein will serve as a fundamental approach for other combinations of 2D materials and oxides, yielding novel device functionalities.
Kevin Musselman
Universität Duisburg-Essen
Engineering
Nanotechnology; Quantum Science
University of Waterloo
Globalink Research Award
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