Commercial-Scale Spatial Atomic Layer Deposition Technology

Researchers at the University of Waterloo have developed atmospheric pressure spatial atomic layer deposition technology for depositing thin films that are nanometers (billionths of a meter) thick. Notably, the developed equipment can deposit these films rapidly, over large areas, in open air. This technology can be useful in a number of sectors, such as display technologies, smart windows, microelectronics, and solar cells. In this research project, the intern will use information collected through the Lab2Market commercialization program to make improvements to the technology that will help bring it to market. This will include the development of a new “reactor” that will improve the quality of the deposited films and the speed and efficiency with which they are deposited.

Faculty Supervisor:

Kevin Musselman

Student:

Partner:

I-INC Foundation for Business Development;iBoost Zone

Discipline:

Engineering

Sector:

Professional, scientific and technical services

University:

University of Waterloo

Program: